Pulsed laser deposition system

Pulsed laser deposition system for epitaxial thin films, assisted in-situ by RHEED monitoring. (TSST system-Netherlands)

Contact Person: Nicu Scarisoreanu
Email: nicu.scarisoreanu@inflpr.ro
Tel: +4021 457 4550

Location: CETAL-Room A008 Cleanroom
Financing project: CETAL 8PM /I 26.11.2008 

The main features of this system are the following:

PLD deposition system:

General characteristics:

  • UHV manipulator for target and substrate
  • Load lock
  • Safety valve; vent valve
  • Possibility of fitting second laser entrance window
  • Standard CF flanges
  • Intelligent window
  • Flanges provided for later extension possibility with effusion cells

Pressure measurement and control:

  • combined upstream/downstream pressure control using mass flow controllers (2 MFCs – one for oxygen; design capability to add more)
  • possibility of quick venting to high oxygen pressures;
  • pressure measurement system over full range (base pressure to atmosphere);
  • dry fore pump;
  • pump system for both chamber and RHEED gun.

Substrate:

  • heater up to 1000 C fully operational in oxygen
  • heater for non-transparent and transparent substrates
  • PID controlled heater
  • Shutter
  • substrate scanning for uniform deposition
  • off axis deposition capability
  • tilting of substrate
  • in-situ thickness measurement (quartz monitor)

Target:

  • motor controlled in situ target selection
  • target rotation (eventual scanning)
  • adjustable target-substrate distance up to 7  cm
  • possibility of accommodating more target sizes
 
RHEED:
  • high pressure operation (up to 500 mTorr)
  • complete system, including camera system for RHEED imaging, data acquisition software, phosphor screen
  • valve for protecting RHEED gun during venting
  • lead glass shields on viewports
  • reducing of vibrations from system control during RHEED imaging
Laser

Surelite  II . YAG:Nd, 10 Hz, (with 3 harmonics :266 nm; 532nm;1,064nm ), energies: 95-682mJ 

Applications:

  • Epitaxial thin films of different materials (oxides, nitrides) for electro-optic, electronic and medical applications.
  • Multilayer heterostructures with different thicknesses for complex material studies